Fig. 1. Schematic diagram of nanostructures using NIL process: (A) EBL equipment for fabricated mold stamp. (B) HEL equipment for nanoimprint pattern with computer controlled electronics. (C) A nickel-based pillar mold can imprint into a PBO-SAM polymer resist layer; afterward, the mold removal and pattern transfer are based on anisotropic etching to remove reside.

Fig. 1. Schematic diagram of nanostructures using NIL process: (A) EBL equipment for fabricated mold stamp. (B) HEL equipment for nanoimprint pattern with computer
controlled electronics. (C) A nickel-based pillar mold can imprint into a PBO-SAM polymer resist layer; afterward, the mold removal and pattern transfer are based on
anisotropic etching to remove reside.