Fig. 7. Simulation results of temperature distribution between Ni stamps and PBO-SAM/PMMA substrate in NIL process: (A) stamp cross-sectional, (B) PMMA substrate cross-sectional, (C) 3-dimensional and (D) intrinsic 3-dimensional views, respectively. The study of computed condition in nanoimprint process is at 150 o C and 50 bar during 10 min. Note that for NIL experimental parameters, the simulated results have already decided before doing nanoimprint experiment.

Fig. 7. Simulation results of temperature distribution between Ni stamps and
PBO-SAM/PMMA substrate in NIL process: (A) stamp cross-sectional, (B) PMMA
substrate cross-sectional, (C) 3-dimensional and (D) intrinsic 3-dimensional views,
respectively. The study of computed condition in nanoimprint process is at 150 o
C
and 50 bar during 10 min. Note that for NIL experimental parameters, the simulated
results have already decided before doing nanoimprint experiment.